Plasma Process-Induced Damage: 2000 5th International Symposium

This text covers topics such as: CVD process damage effects; electron shading mechanism; front-end process damage effects; damage in multilevel interconnects; damage effects characterization; 300mm technology; thin dielectrics and degradation mechanisms and antenna test structures and design....
By Calif.) International Symposium on Plasma Process-Induced Damage (5th : 2000 : Santa Clara
Paperback: 182 pages
Publisher: IEEE (December 1, 2000)
Language: English
ISBN-10: 0965157741
ISBN-13: 978-0965157742
Product Dimensions: 8.2 x 0.5 x 10.5 inches
Format: PDF ePub TXT ebook
- Plasma Process-Induced Damage: 2000 5th International Symposium pdf
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